PREDICTING THIN-FILM STOICHIOMETRY IN REACTIVE SPUTTERING

被引：174

作者：

BERG, S

LARSSON, T

NENDER, C

BLOM, HO

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1988年 / 63卷 / 03期

关键词：

D O I：

10.1063/1.340030

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：887 / 891

页数：5

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