HIGH-RATE REACTIVE SPUTTER DEPOSITION OF ALUMINUM-OXIDE

[1] MECHANISMS OF VOLTAGE-CONTROLLED, REACTIVE, PLANAR MAGNETRON SPUTTERING OF AL IN AR-N2 AND AR-O2 ATMOSPHERES [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1984, 2 (03): : 1275 - 1284

[2] REACTIVE DEPOSITION OF LOW-LOSS AL2O3 OPTICAL-WAVEGUIDES BY MODIFIED DC PLANAR MAGNETRON SPUTTERING [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1984, 2 (03): : 1238 - 1247

[3] HIGH-RATE RF SPUTTERING SYSTEM [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1970, 7 (02): : 343 - &

[4] HIGH-RATE REACTIVE SPUTTER DEPOSITION OF ZIRCONIUM DIOXIDE [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1988, 6 (06): : 3088 - 3097

[5] LYNCH J, 1986, ENG PROPERTIES SELEC

[6] THE DEPENDENCE OF DEPOSITION RATE ON POWER INPUT FOR DC AND RF MAGNETRON SPUTTERING [J]. VACUUM, 1981, 31 (07) : 315 - 317

[7] REACTIVE HIGH-RATE DC SPUTTERING OF OXIDES [J]. THIN SOLID FILMS, 1984, 119 (02) : 203 - 209

[8] MECHANISM OF RF REACTIVE SPUTTERING [J]. JOURNAL OF APPLIED PHYSICS, 1975, 46 (08) : 3381 - 3384

[9] THORNTON JA, 1978, THIN FILM PROCESSES, P106

[10] 1986, CRC HDB PHYSICS CHEM

[1] MECHANISMS OF VOLTAGE-CONTROLLED, REACTIVE, PLANAR MAGNETRON SPUTTERING OF AL IN AR-N2 AND AR-O2 ATMOSPHERES [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1984, 2 (03): : 1275 - 1284

[2] REACTIVE DEPOSITION OF LOW-LOSS AL2O3 OPTICAL-WAVEGUIDES BY MODIFIED DC PLANAR MAGNETRON SPUTTERING [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1984, 2 (03): : 1238 - 1247

[3] HIGH-RATE RF SPUTTERING SYSTEM [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1970, 7 (02): : 343 - &

[4] HIGH-RATE REACTIVE SPUTTER DEPOSITION OF ZIRCONIUM DIOXIDE [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1988, 6 (06): : 3088 - 3097

[5] LYNCH J, 1986, ENG PROPERTIES SELEC

[6] THE DEPENDENCE OF DEPOSITION RATE ON POWER INPUT FOR DC AND RF MAGNETRON SPUTTERING [J]. VACUUM, 1981, 31 (07) : 315 - 317

[7] REACTIVE HIGH-RATE DC SPUTTERING OF OXIDES [J]. THIN SOLID FILMS, 1984, 119 (02) : 203 - 209

[8] MECHANISM OF RF REACTIVE SPUTTERING [J]. JOURNAL OF APPLIED PHYSICS, 1975, 46 (08) : 3381 - 3384

[9] THORNTON JA, 1978, THIN FILM PROCESSES, P106

[10] 1986, CRC HDB PHYSICS CHEM