MICROWAVE MULTIPOLAR PLASMA FOR ETCHING AND DEPOSITION

[21] PICHOT M, UNPUB

[22] Pichot M. G., 1985, Microelectronic Engineering, V3, P411, DOI 10.1016/0167-9317(85)90051-6

[23] MICROWAVE EXCITATION OF LARGE VOLUMES OF PLASMA AT ELECTRON-CYCLOTRON RESONANCE IN MULTIPOLAR CONFINEMENT [J]. PHYSICS LETTERS A, 1984, 106 (07) : 301 - 304

[24] ANISOTROPIC ETCHING OF SILICON USING AN SF6/AR MICROWAVE MULTIPOLAR PLASMA [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1986, 4 (01): : 1 - 5

[25] SPHERICAL MULTIPOLE MAGNETS FOR PLASMA RESEARCH [J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1969, 40 (12) : 1545 - &

[26] PLASMA CONFINEMENT WITH SPHERICAL MULTIPOLE MAGNETIC FIELD [J]. PHYSICS LETTERS A, 1967, A 25 (09) : 695 - &

[27] CURRENT STATUS OF REDUCED TEMPERATURE SILICON EPITAXY BY CHEMICAL VAPOR-DEPOSITION [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1987, 134 (06) : 1518 - 1524

[28] MICROWAVE PLASMA ETCHING [J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1977, 16 (11) : 1979 - 1984

[21] PICHOT M, UNPUB

[22] Pichot M. G., 1985, Microelectronic Engineering, V3, P411, DOI 10.1016/0167-9317(85)90051-6

[23] MICROWAVE EXCITATION OF LARGE VOLUMES OF PLASMA AT ELECTRON-CYCLOTRON RESONANCE IN MULTIPOLAR CONFINEMENT [J]. PHYSICS LETTERS A, 1984, 106 (07) : 301 - 304

[24] ANISOTROPIC ETCHING OF SILICON USING AN SF6/AR MICROWAVE MULTIPOLAR PLASMA [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1986, 4 (01): : 1 - 5

[25] SPHERICAL MULTIPOLE MAGNETS FOR PLASMA RESEARCH [J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1969, 40 (12) : 1545 - &

[26] PLASMA CONFINEMENT WITH SPHERICAL MULTIPOLE MAGNETIC FIELD [J]. PHYSICS LETTERS A, 1967, A 25 (09) : 695 - &

[27] CURRENT STATUS OF REDUCED TEMPERATURE SILICON EPITAXY BY CHEMICAL VAPOR-DEPOSITION [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1987, 134 (06) : 1518 - 1524

[28] MICROWAVE PLASMA ETCHING [J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1977, 16 (11) : 1979 - 1984