MICROWAVE MULTIPOLAR PLASMA FOR ETCHING AND DEPOSITION

被引:8
作者
BURKE, RR [1 ]
POMOT, C [1 ]
机构
[1] CTR NATL ETUD TELECOMMUN,CTR MICROELECTR NORBERT SEGARD,CNRS,UNITE RECH DO328,F-38243 MEYLAN,FRANCE
关键词
D O I
10.1016/0169-4332(89)90922-7
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
引用
收藏
页码:267 / 277
页数:11
相关论文
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