ELECTRICAL-PROPERTIES AND STABILIZATION OF SPUTTERED FILMS BY INERT-GAS PRECIPITATION

被引：12

作者：

NAVINSEK, B ^{[1
]}

ZABKAR, T ^{[1
]}

机构：

[1] UNIV LJUBLJANA, INST J STEFAN, YU-61000 LJUBLJANA, YUGOSLAVIA

来源：

关键词：

D O I：

10.1016/0040-6090(76)90394-1

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：41 / 45

页数：5

共 8 条

[1] INCORPORATION AND BEHAVIOR OF HELIUM IN CO-DEPOSITED FILMS [J].

BERG, RS ;

KOMINIAK, GJ ;

MATTOX, DM .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (01) :52-55

CROSET, M ;

RIGO, S ;

AMSEL, G .

[3]

JONES ME, 1968, 4TH P INT VAC C MANC, P557

[4] USE OF SPUTTERED CONDUCTOR MATERIALS IN FILM INTEGRATED-CIRCUITS [J].

LAU, SS .

[5]

Lee C. C., 1970, PROGR PHYS ORG CHEM, V7, P129

[6]

MITCHELL IV, 1971, VACUUM, V21, P591

[7]

REED DJ, 1974, VACUUM, V24, P179

[8] GAS INCORPORATION INTO SPUTTERED FILMS [J].

WINTERS, HF ;

KAY, E .