STRUCTURAL AND ELECTRONIC-PROPERTIES OF COSI2 EPITAXIALLY GROWN ON SI(111)

[1] SILICON METAL SILICIDE HETEROSTRUCTURES GROWN BY MOLECULAR-BEAM EPITAXY [J]. APPLIED PHYSICS LETTERS, 1980, 37 (07) : 643 - 646

[2] CHAINET E, 1985, PHYS REV B, V31, P7469, DOI 10.1103/PhysRevB.31.7469

[3] LOCAL-STRUCTURE DETERMINATION OF THE CO-SI(111) INTERFACE BY SURFACE ELECTRON ENERGY-LOSS FINE-STRUCTURE TECHNIQUE [J]. SURFACE SCIENCE, 1986, 168 (1-3) : 801 - 809

[4] FORMATION AND STRUCTURE OF EPITAXIAL NISI2 AND COSI2 [J]. THIN SOLID FILMS, 1982, 93 (1-2) : 135 - 141

[5] ATOMIC-STRUCTURE OF THE NISI2/(111)SI INTERFACE [J]. PHILOSOPHICAL MAGAZINE A-PHYSICS OF CONDENSED MATTER STRUCTURE DEFECTS AND MECHANICAL PROPERTIES, 1982, 46 (05): : 849 - 862

[6] STRUCTURE AND NUCLEATION MECHANISM OF NICKEL SILICIDE ON SI(111) DERIVED FROM SURFACE EXTENDED-X-RAY-ABSORPTION FINE-STRUCTURE [J]. PHYSICAL REVIEW LETTERS, 1983, 51 (26) : 2402 - 2405

[7] HIGH-RESOLUTION ELECTRON-MICROSCOPY OF THE INITIAL-STAGES OF COSI2 FORMATION ON SI(111) [J]. SURFACE SCIENCE, 1986, 168 (1-3) : 751 - 763

[8] DANTERROCHES C, 1985, UNPUB THIN SOLID FIL

[9] DAVITAYA FA, 1985, J VACUUM SCI TECHN B, V2, P770

[10] EXTENDED FINE-STRUCTURES ABOVE TI L2,3 EDGE - A COMPARISON BETWEEN REFLECTION ENERGY-LOSS AND EXTENDED X-RAY-ABSORPTION FINE-STRUCTURE RESULTS [J]. PHYSICAL REVIEW B, 1984, 29 (06): : 3730 - 3732

[1] SILICON METAL SILICIDE HETEROSTRUCTURES GROWN BY MOLECULAR-BEAM EPITAXY [J]. APPLIED PHYSICS LETTERS, 1980, 37 (07) : 643 - 646

[2] CHAINET E, 1985, PHYS REV B, V31, P7469, DOI 10.1103/PhysRevB.31.7469

[3] LOCAL-STRUCTURE DETERMINATION OF THE CO-SI(111) INTERFACE BY SURFACE ELECTRON ENERGY-LOSS FINE-STRUCTURE TECHNIQUE [J]. SURFACE SCIENCE, 1986, 168 (1-3) : 801 - 809

[4] FORMATION AND STRUCTURE OF EPITAXIAL NISI2 AND COSI2 [J]. THIN SOLID FILMS, 1982, 93 (1-2) : 135 - 141

[5] ATOMIC-STRUCTURE OF THE NISI2/(111)SI INTERFACE [J]. PHILOSOPHICAL MAGAZINE A-PHYSICS OF CONDENSED MATTER STRUCTURE DEFECTS AND MECHANICAL PROPERTIES, 1982, 46 (05): : 849 - 862

[6] STRUCTURE AND NUCLEATION MECHANISM OF NICKEL SILICIDE ON SI(111) DERIVED FROM SURFACE EXTENDED-X-RAY-ABSORPTION FINE-STRUCTURE [J]. PHYSICAL REVIEW LETTERS, 1983, 51 (26) : 2402 - 2405

[7] HIGH-RESOLUTION ELECTRON-MICROSCOPY OF THE INITIAL-STAGES OF COSI2 FORMATION ON SI(111) [J]. SURFACE SCIENCE, 1986, 168 (1-3) : 751 - 763

[8] DANTERROCHES C, 1985, UNPUB THIN SOLID FIL

[9] DAVITAYA FA, 1985, J VACUUM SCI TECHN B, V2, P770

[10] EXTENDED FINE-STRUCTURES ABOVE TI L2,3 EDGE - A COMPARISON BETWEEN REFLECTION ENERGY-LOSS AND EXTENDED X-RAY-ABSORPTION FINE-STRUCTURE RESULTS [J]. PHYSICAL REVIEW B, 1984, 29 (06): : 3730 - 3732