CHARACTERIZATION OF COSPUTTERED TUNGSTEN CARBIDE THIN-FILMS

被引：6

作者：

YANG, HY ^{[1
]}

ZHAO, XA ^{[1
]}

NICOLET, MA ^{[1
]}

机构：

[1] CALTECH,PASADENA,CA 91125

来源：

THIN SOLID FILMS | 1988年 / 158卷 / 01期

关键词：

D O I：

10.1016/0040-6090(88)90300-8

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：37 / 44

页数：8

共 25 条

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[4]

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[8]

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[9] DIFFUSION-BARRIERS IN LAYERED CONTACT STRUCTURES [J].

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[10] DIFFUSION BARRIERS IN THIN-FILMS [J].

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