ATOMIC-COLLISIONS IN SURFACE-CHEMISTRY AND FILM DEPOSITION

被引：8

作者：

RABALAIS, JW

MARTON, D

机构：

[1] Department of Chemistry, University of Houston, Houston

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1992年 / 67卷 / 1-4期

基金：

美国国家科学基金会;

关键词：

D O I：

10.1016/0168-583X(92)95819-D

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Low-energy, mass-selected ion beams provide access to an interesting, important, and poorly understood regime of ion-surface interactions. Ions in the range of 1 to 100 eV span the range from chemical bond energies to lattice penetration energies. Such hyperthermal reactants can be used to induce chemical reactions with significant activation barriers, select reaction mechanism pathways, and deposit unique thin films. This review provides a brief overview of the surface chemistry and film deposition that is achievable through the use of hyperthermal beams. Detailed examples are provided for the reactions of C+, O+, and CO+ ions with Ni(111) and for deposition of diamondlike films using C+ beams.

引用

收藏

页码：287 / 295

页数：9

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