共 12 条
- [1] Andrews H.C., 1970, COMPUTER TECHNIQUES
- [2] BEAUCHAMP KG, 1975, WALSH FUNCTIONS THEI
- [3] PROXIMITY EFFECT IN ELECTRON-BEAM LITHOGRAPHY [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06): : 1271 - 1275
- [4] ELLIOT DF, 1982, FAST TRANSFORMS ALGO
- [5] EXPOSURE AND DEVELOPMENT MODELS USED IN ELECTRON-BEAM LITHOGRAPHY [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (01): : 1 - 17
- [6] ION-BEAM EXPOSURE PROFILES IN PMMA-COMPUTER SIMULATION [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04): : 1259 - 1263
- [7] KERN DP, 1980, 9TH P INT S EL ION B, P326
- [8] VERIFICATION OF A PROXIMITY EFFECT CORRECTION PROGRAM IN ELECTRON-BEAM LITHOGRAPHY [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04): : 1264 - 1268
- [10] RABINER LR, 1975, THEORY APPLICATION D