THE INTERPRETATION OF ELLIPSOMETRIC MEASUREMENTS OF ION-BOMBARDMENT OF NOBLE-GASES ON SEMICONDUCTOR SURFACES

被引:13
作者
HOLTSLAG, AHM
SLAGER, UC
VANSILFHOUT, A
机构
关键词
D O I
10.1016/0039-6028(85)90523-0
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
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页码:1079 / 1085
页数:7
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