EXCIMER LASER LITHOGRAPHY USING CONTRAST ENHANCING MATERIAL

被引：4

作者：

ENDO, M

SASAGO, M

NAKAGAWA, H

HIRAI, Y

OGAWA, K

ISHIHARA, T

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1988年 / 6卷 / 02期

关键词：

D O I：

10.1116/1.584399

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：559 / 563

页数：5

共 14 条

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[9] APPLICATION OF DIAZONAPHTHOQUINONE COMPOUNDS AND A DIAZONIUM SALT TO CONTRAST ENHANCED LITHOGRAPHY [J].

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