CHAIN SCISSION EFFICIENCY AND REACTIVE-ION ETCH RESISTANCE OF ALTERNATING COPOLYMERS OF STYRENE AND OLEFINS TRISUBSTITUTED OR TETRASUBSTITUTED WITH ELECTRON-WITHDRAWING GROUPS

被引：13

作者：

ITO, H

HRUSA, C

HALL, HK

PADIAS, AB

机构：

来源：

JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY | 1986年 / 24卷 / 05期

关键词：

D O I：

10.1002/pola.1986.080240513

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

引用

收藏

页码：955 / 964

页数：10

相关论文

共 41 条

[1] ANDERSON CC, 1984, ACS SYM SER, V242, P119
[2] MOLECULAR-WEIGHT DEPENDENCE OF DEVELOPED CONTOURS IN POLY-(METHYL METHACRYLATE) ELECTRON RESISTS
ATODA, N
KOMURO, M
KAWAKATSU, H
[J]. JOURNAL OF APPLIED PHYSICS, 1979, 50 (05) : 3707 - 3712
[3] POLY(STYRENE SULFONE) - SENSITIVE ION-MILLABLE POSITIVE ELECTRON-BEAM RESIST
BOWDEN, MJ
THOMPSON, LF
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1974, 121 (12) : 1620 - 1623
[4] A SENSITIVE NOVOLAC-BASED POSITIVE ELECTRON RESIST
BOWDEN, MJ
THOMPSON, LF
FAHRENHOLTZ, SR
DOERRIES, EM
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1981, 128 (06) : 1304 - 1313
[5] IRRADIATION OF AROMATIC POLYMERS - THE EFFECT OF IRRADIATION TEMPERATURE ON CROSSLINKING AND SCISSION IN POLYSTYRENE
BOWMER, TN
ODONNELL, JH
WINZOR, DJ
[J]. JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY, 1981, 19 (05) : 1167 - 1174
[6] Chapiro A., 1962, RAD CHEM POLYM SYSTE
[7] CHARLESBY A, 1960, ATOMIC RAD POLYM, P135
[8] Dole M., 1972, RAD CHEM MACROMOLECU
[9] PARAMETERS AFFECTING ELECTRON-BEAM SENSITIVITY OF POLY(METHYL METHACRYLATE)
GIPSTEIN, E
OUANO, AC
JOHNSON, DE
NEED, OU
[J]. IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1977, 21 (02) : 143 - 153
[10] DRY ETCH RESISTANCE OF ORGANIC MATERIALS
GOKAN, H
ESHO, S
OHNISHI, Y
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1983, 130 (01) : 143 - 146

← 1 2 3 4 5 →