SCANNING ELECTRON-BEAM METHOD FOR EXAMINING SURFACES IN A SHORT FOCAL LENGTH MAGNETIC LENS

被引：4

作者：

BROERS, AN ^{[1
]}

COANE, PA ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

APPLIED PHYSICS LETTERS | 1986年 / 49卷 / 02期

关键词：

D O I：

10.1063/1.97349

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：115 / 117

页数：3

共 9 条

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[5] DETECTORS FOR THE SCANNING ELECTRON-MICROSCOPE [J].

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[6] RECENT ADVANCES IN ELECTRON-BEAM LITHOGRAPHY FOR THE HIGH-VOLUME PRODUCTION OF VLSI DEVICES [J].

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[7]

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[8]

STURANS MA, 1984, MICROCIRCUIT ENG 84, P107

[9] METHOD FOR EXAMINING SOLID SPECIMENS WITH IMPROVED RESOLUTION IN SCANNING ELECTRON-MICROSCOPE (SEM) [J].

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APPLIED PHYSICS LETTERS, 1973, 23 (06) :353-355

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