INITIAL-STAGES OF IRIDIUM-SEMICONDUCTOR COMPOUND FORMATION - A FIELD-ION-MICROSCOPE STUDY OF INTERFACE ATOMIC STRUCTURES

被引：12

作者：

LIU, HF

LIU, HM

TSONG, TT

机构：

来源：

PHYSICAL REVIEW LETTERS | 1986年 / 56卷 / 01期

关键词：

D O I：

10.1103/PhysRevLett.56.65

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

引用

页码：65 / 68

页数：4

共 9 条

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[8] FORMATION OF ULTRATHIN SINGLE-CRYSTAL SILICIDE FILMS ON SI - SURFACE AND INTERFACIAL STABILIZATION OF SI-NISI2 EPITAXIAL STRUCTURES [J].

TUNG, RT ;

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[9] SCHOTTKY-BARRIER FORMATION AT SINGLE-CRYSTAL METAL-SEMICONDUCTOR INTERFACES [J].

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