GROWTH OF THIN SINGLE-CRYSTAL NISI2 FILMS ON SI SURFACES, A FIELD-ION MICROSCOPE STUDY

被引：8

作者：

LIU, HF

LIU, HM

TSONG, TT

机构：

来源：

APPLIED PHYSICS LETTERS | 1985年 / 47卷 / 05期

关键词：

D O I：

10.1063/1.96114

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：524 / 526

页数：3

共 14 条

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[5]

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[6]

Muller E W, 1969, FIELD ION MICROSCOPY

[7] ATOM-PROBE STUDY OF SILICIDE FORMATION AT NI/SI INTERFACES [J].

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[8]

Poate J M, 1978, THIN FILMS INTERDIFF

[9]

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[10] THEORETICAL-MODELS OF SCHOTTKY BARRIERS [J].

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THIN SOLID FILMS, 1982, 93 (1-2) :3-19

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