PROCESS-CONTROL WITH CHEMICAL AMPLIFICATION RESISTS USING DEEP ULTRAVIOLET AND X-RAY-RADIATION

被引：43

作者：

SELIGSON, D ^{[1
]}

DAS, S ^{[1
]}

GAW, H ^{[1
]}

PIANETTA, P ^{[1
]}

机构：

[1] STANFORD UNIV,SYNCHROTRON RADIAT LAB,STANFORD,CA 94305

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1988年 / 6卷 / 06期

关键词：

D O I：

10.1116/1.584075

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：2303 / 2307

页数：5

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