THERMAL AND ION-INDUCED DISSOCIATION OF NISI AND NISI2 IN CONTACT WITH NICKEL

被引：14

作者：

HUNG, LS

MAYER, JW

机构：

来源：

关键词：

D O I：

10.1016/0040-6090(83)90033-0

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：85 / 92

页数：8

共 16 条

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LAU, SS
HUNG, LS
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[6] MAYER JW, 1983, SURFACE MODIFICATION
[7] DISSOCIATION OF PTSI, NISI, AND PDGE IN PRESENCE OF PT, NI AND PD FILMS, RESPECTIVELY
OTTAVIANI, G
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CANALI, C
[J]. APPLIED PHYSICS, 1979, 18 (03): : 285 - 289
[8] OTTAVIANI G, 1981, RELIABILITY DEGRADAT, pCH2
[9] PRODUCTION AND ANNEALING OF ION-BOMBARDMENT DAMAGE IN SILICIDES OF PT, PD, AND NI
TSAUR, BY
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[10] ION-BEAM-INDUCED SILICIDE FORMATION
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