PREVENTION OF CIRCUMFERENTIAL MELTBACK IN LPE GROWTH OF INP INGAASP INGAAS INP LAYERS FOR AVALANCHE PHOTO-DIODES

被引:8
作者
KONDO, S
AMANO, T
NAGAI, H
机构
关键词
D O I
10.1016/0022-0248(83)90273-7
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
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页码:8 / 14
页数:7
相关论文
共 9 条
[1]   EFFECT OF BAKING TEMPERATURE ON PURITY OF LPE GA0.47IN0.53AS [J].
AMANO, T ;
TAKAHEI, K ;
NAGAI, H .
JAPANESE JOURNAL OF APPLIED PHYSICS, 1981, 20 (11) :2105-2109
[2]   INGAAS-INP SEPARATED ABSORPTION AND MULTIPLICATION REGIONS AVALANCHE PHOTO-DIODE USING LIQUID-PHASE AND VAPOR-PHASE EPITAXIES [J].
ANDO, H ;
YAMAUCHI, Y ;
NAKAGOME, H ;
SUSA, N ;
KANBE, H .
IEEE JOURNAL OF QUANTUM ELECTRONICS, 1981, 17 (02) :250-254
[3]   1.67-MU-M GA0.47IN0.53AS-INP DH LASERS DOUBLE CLADDED WITH INP BY LPE TECHNIQUE [J].
ARAI, S ;
SUEMATSU, Y ;
ITAYA, Y .
JAPANESE JOURNAL OF APPLIED PHYSICS, 1979, 18 (03) :709-710
[4]  
KANBE H, 1981, ELECTRON LETT, V16, P163
[5]   A HIGH-GAIN IN0.53GA0.47AS-INP AVALANCHE PHOTO-DIODE WITH NO TUNNELING LEAKAGE CURRENT [J].
KIM, OK ;
FORREST, SR ;
BONNER, WA ;
SMITH, RG .
APPLIED PHYSICS LETTERS, 1981, 39 (05) :402-404
[6]   ULTIMATE LOW-LOSS SINGLE-MODE FIBER AT 1.55 MU-M [J].
MIYA, T ;
TERUNUMA, Y ;
HOSAKA, T ;
MIYASHITA, T .
ELECTRONICS LETTERS, 1979, 15 (04) :106-108
[7]   CRACK FORMATION IN INP-GAXIN1-XAS-INP DOUBLE-HETEROSTRUCTURE FABRICATION [J].
NAGAI, H ;
NOGUCHI, Y .
APPLIED PHYSICS LETTERS, 1976, 29 (11) :740-741
[8]  
NAKAJIMA K, 1982, JAPAN J APPL PHYS LE, V21, P237
[9]   NEW INGAAS-INP AVALANCHE PHOTO-DIODE STRUCTURE FOR THE 1-1.6 MU-M WAVELENGTH REGION [J].
SUSA, N ;
NAKAGOME, H ;
MIKAMI, O ;
ANDO, H ;
KANBE, H .
IEEE JOURNAL OF QUANTUM ELECTRONICS, 1980, 16 (08) :864-870