TOPOGRAPHY-INDUCED THICKNESS VARIATION ANOMALIES FOR SPIN-COATED, THIN-FILMS

被引：19

作者：

WHITE, LK

MISZKOWSKI, N

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1985年 / 3卷 / 03期

关键词：

D O I：

10.1116/1.583117

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：862 / 868

页数：7

共 13 条

[1] PLANARIZATION OF PHOSPHORUS-DOPED SILICON DIOXIDE [J].

ADAMS, AC ;

CAPIO, CD .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1981, 128 (02) :423-429

[2] A 3-LAYER RESIST SYSTEM FOR DEEP UV AND RIE MICROLITHOGRAPHY ON NONPLANAR SURFACES [J].

BASSOUS, E ;

EPHRATH, LM ;

PEPPER, G ;

MIKALSEN, DJ .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1983, 130 (02) :478-484

[3]

DAUGHTON WJ, 1982, J ELECTROCHEM SOC, V129, P178

[4] FLOW OF A VISCOUS LIQUID ON A ROTATING DISK [J].

EMSLIE, AG ;

BONNER, FT ;

PECK, LG .

JOURNAL OF APPLIED PHYSICS, 1958, 29 (05) :858-862

[5]

HIRATA K, 1981, IEEE T ELECTRON DEVI, V28, P1373

[6] CHARACTERISTICS OF RESIST FILMS PRODUCED BY SPINNING [J].

MEYERHOFER, D .

JOURNAL OF APPLIED PHYSICS, 1978, 49 (07) :3993-3997

[7] PROCESS FOR FORMING PASSIVATED METAL INTERCONNECTION SYSTEM WITH A PLANAR SURFACE [J].

ROTHMAN, LB .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1983, 130 (05) :1131-1136

[8] PROPERTIES OF THIN POLYIMIDE FILMS [J].

ROTHMAN, LB .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (10) :2216-2220

[9]

WASHO BD, 1977, IBM J RES DEV, V21, P90

[10] PLANARIZATION PHENOMENA IN MULTILAYER RESIST PROCESSING [J].

WHITE, LK .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (04) :1235-1240

← 1 2 →