SURFACE SEGREGATION AND INITIAL OXIDATION OF TITANIUM SILICIDE FILMS

[1] THERMAL-OXIDATION OF TRANSITION-METAL SILICIDES - THE ROLE OF MASS-TRANSPORT [J]. THIN SOLID FILMS, 1983, 107 (01) : 55 - 65

[2] BEHRISCH R, 1981, SPUTTERING PARTICLE, V1, P169

[3] SURFACE SEGREGATION IN CU-NI AND CU-PT ALLOYS - COMPARISON OF LOW-ENERGY ION-SCATTERING RESULTS WITH THEORY [J]. SURFACE SCIENCE, 1978, 71 (03) : 657 - 678

[4] CHEMICAL BONDING AND REACTIONS AT TI/SI AND TI/OXYGEN/SI INTERFACES [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1983, 1 (02): : 771 - 775

[5] DAVIS LE, 1978, HDB AUGER ELECTRON S

[6] OXIDATION OF SILICIDE THIN-FILMS - TISI2 [J]. APPLIED PHYSICS LETTERS, 1983, 42 (04) : 361 - 363

[7] STATISTICAL THERMODYNAMICS OF THE SURFACE OF A REGULAR SOLUTION [J]. TRANSACTIONS OF THE FARADAY SOCIETY, 1945, 41 (03): : 150 - 156

[8] THERMAL NITRIDATION OF SILICON DIOXIDE FILMS [J]. JOURNAL OF APPLIED PHYSICS, 1982, 53 (10) : 6996 - 7002

[9] CRYSTALLIZATION AND RESISTIVITY OF AMORPHOUS TITANIUM SILICIDE FILMS DEPOSITED BY CO-EVAPORATION [J]. JOURNAL OF APPLIED PHYSICS, 1982, 53 (09) : 6214 - 6219

[10] MOHAMMADI F, 1981, SOLID STATE TECHNOL, V24, P65

[1] THERMAL-OXIDATION OF TRANSITION-METAL SILICIDES - THE ROLE OF MASS-TRANSPORT [J]. THIN SOLID FILMS, 1983, 107 (01) : 55 - 65

[2] BEHRISCH R, 1981, SPUTTERING PARTICLE, V1, P169

[3] SURFACE SEGREGATION IN CU-NI AND CU-PT ALLOYS - COMPARISON OF LOW-ENERGY ION-SCATTERING RESULTS WITH THEORY [J]. SURFACE SCIENCE, 1978, 71 (03) : 657 - 678

[4] CHEMICAL BONDING AND REACTIONS AT TI/SI AND TI/OXYGEN/SI INTERFACES [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1983, 1 (02): : 771 - 775

[5] DAVIS LE, 1978, HDB AUGER ELECTRON S

[6] OXIDATION OF SILICIDE THIN-FILMS - TISI2 [J]. APPLIED PHYSICS LETTERS, 1983, 42 (04) : 361 - 363

[7] STATISTICAL THERMODYNAMICS OF THE SURFACE OF A REGULAR SOLUTION [J]. TRANSACTIONS OF THE FARADAY SOCIETY, 1945, 41 (03): : 150 - 156

[8] THERMAL NITRIDATION OF SILICON DIOXIDE FILMS [J]. JOURNAL OF APPLIED PHYSICS, 1982, 53 (10) : 6996 - 7002

[9] CRYSTALLIZATION AND RESISTIVITY OF AMORPHOUS TITANIUM SILICIDE FILMS DEPOSITED BY CO-EVAPORATION [J]. JOURNAL OF APPLIED PHYSICS, 1982, 53 (09) : 6214 - 6219

[10] MOHAMMADI F, 1981, SOLID STATE TECHNOL, V24, P65