MATERIAL PROCESSING WITH BROAD-BEAM ION SOURCES

被引：43

作者：

HARPER, JME ^{[1
]}

CUOMO, JJ ^{[1
]}

KAUFMAN, HR ^{[1
]}

机构：

[1] COLORADO STATE UNIV, DEPT PHYS, FT COLLINS, CO 80523 USA

来源：

ANNUAL REVIEW OF MATERIALS SCIENCE | 1983年 / 13卷

关键词：

D O I：

10.1146/annurev.ms.13.080183.002213

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：413 / 439

页数：27

共 78 条

[71] Vossen J.L., 1978, THIN FILM PROCESSES
[72] ION-BEAM SPUTTERING AND ITS APPLICATION FOR DEPOSITION OF SEMICONDUCTING FILMS
WEISSMANTEL, C
FIEDLER, O
HECHT, G
REISSE, G
[J]. THIN SOLID FILMS, 1972, 13 (02) : 359 - 366
[73] PREPARATION AND PROPERTIES OF HARD I-C AND I-BN COATINGS
WEISSMANTEL, C
BEWILOGUA, K
BREUER, K
DIETRICH, D
EBERSBACH, U
ERLER, HJ
RAU, B
REISSE, G
[J]. THIN SOLID FILMS, 1982, 96 (01) : 31 - 44
[74] REACTIVE FILM PREPARATION
WEISSMANTEL, C
[J]. THIN SOLID FILMS, 1976, 32 (01) : 11 - 18
[75] WEISSMANTEL C, 1981, THIN SOLID FILMS, V63, P315
[76] FABRICATION OF OPTICAL-WAVEGUIDES BY ION-BEAM SPUTTERING
WESTWOOD, WD
INGREY, SJ
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1976, 13 (01): : 104 - 106
[77] WILSON RG, 1973, ION BEAMS APPLICATIO
[78] ETCHING OF SILICON WITH XEF2 VAPOR
WINTERS, HF
COBURN, JW
[J]. APPLIED PHYSICS LETTERS, 1979, 34 (01) : 70 - 73