ANALYSIS OF PPMMA FILMS FROM OXYGEN PLASMA USING X-RAY PHOTOELECTRON-SPECTROSCOPY

被引：6

作者：

KURUVILLA, BA

ZAMBRE, M

GOSAVI, S

GORWADKAR, S

DATTA, A

GANGAL, SA

KULKARNI, SK

机构：

[1] UNIV POONA,DEPT PHYS,CTR ADV STUDIES MAT SCI,POONA 411007,MAHARASHTRA,INDIA

[2] ALCHEM RES CTR,THANA 400601,INDIA

[3] UNIV POONA,DEPT ELECTR SCI,POONA 411007,MAHARASHTRA,INDIA

来源：

JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY | 1994年 / 32卷 / 12期

关键词：

PLASMA POLYMERIZATION; ELECTRON BEAM RESIST; X-RAY PHOTOELECTRON SPECTROSCOPY;

D O I：

10.1002/pola.1994.080321209

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

Plasma polymerized methyl methacrylate (PPMMA) films have been synthesised on silicon substrates in RF glow discharge using oxygen plasma. The electron beam delineation sensitivity of the PPMMA films has been studied systematically by varying oxygen and monomer flow rates. X-ray photoelectron spectroscopy (XPS) analysis clearly illustrates how C/O ratio in the films determines the properties of PPMMA films as electron beam resist. (C) 1994 John Wiley & Sons, Inc.

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页码：2275 / 2281

页数：7

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