ANGLE-RESOLVED X-RAY PHOTOELECTRON-SPECTROSCOPY STUDY FOR REACTIVE-SPUTTER-ETCHED GAAS SURFACE

被引：2

作者：

YABUMOTO, N

OSHIMA, M

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1985年 / 132卷 / 09期

关键词：

D O I：

10.1149/1.2114324

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：2224 / 2227

页数：4

共 12 条

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