CHEMICAL ETCHING OF GERMANIUM IN SOLUTIONS OF HF, HNO3, H2O, AND HC2H3O2

被引：28

作者：

SCHWARTZ, B

ROBBINS, H

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1964年 / 111卷 / 02期

关键词：

D O I：

10.1149/1.2426082

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：196 / 201

页数：6

共 16 条

[1] ETCHING GE WITH MIXTURES OF HF-H2O2-H2O [J].

BLOEM, J ;

VANVESSEM, JC .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1962, 109 (01) :33-36

[2]

BURGESS T, COMMUNICATION

[3] CHEMICAL ETCHING OF GERMANIUM IN HF-HNO3-H2O SOLUTIONS [J].

BURGESS, TE .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1962, 109 (04) :341-342

[4] A STUDY OF THE ETCHING RATE OF SINGLE-CRYSTAL GERMANIUM [J].

CAMP, PR .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1955, 102 (10) :586-593

[5]

COTTON FA, 1962, ADVANCED INORGANIC C, P368

[6] THE REACTION OF GERMANIUM WITH NITRIC ACID SOLUTIONS .1. THE DISSOLUTION REACTION [J].

CRETELLA, MC ;

GATOS, HC .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1958, 105 (09) :487-496

[7] ETCHING OF SINGLE CRYSTAL GERMANIUM SPHERES [J].

ELLIS, RC .

JOURNAL OF APPLIED PHYSICS, 1954, 25 (12) :1497-1499

[8] THE REACTION OF GERMANIUM WITH AQUEOUS SOLUTIONS .1. DISSOLUTION KINETICS IN WATER CONTAINING DISSOLVED OXYGEN [J].

HARVEY, WW ;

GATOS, HC .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1958, 105 (11) :654-660

[9]

HOLMES PJ, 1962, ELECTROCHEMISTRY SEM, P212

[10] CONTROLLED ETCHING OF SILICON IN THE HF-HNO3 SYSTEM [J].

KLEIN, DL ;

DSTEFAN, DJ .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1962, 109 (01) :37-42

← 1 2 →