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INFLUENCE OF THE INTERFACE AND OF THE CHANNEL VOLUME ON 1/F NOISE OF MOS-TRANSISTORS BIASED IN THE LINEAR REGION AT STRONG INVERSION
被引:7
作者
:
GRABOWSKI, F
论文数:
0
引用数:
0
h-index:
0
GRABOWSKI, F
机构
:
来源
:
SOLID-STATE ELECTRONICS
|
1988年
/ 31卷
/ 01期
关键词
:
D O I
:
10.1016/0038-1101(88)90094-9
中图分类号
:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号
:
0808 ;
0809 ;
摘要
:
引用
收藏
页码:115 / 120
页数:6
相关论文
共 15 条
[1]
THEORY OF LOW FREQUENCY NOISE IN SI MOSTS
[J].
BERZ, F
论文数:
0
引用数:
0
h-index:
0
BERZ, F
.
SOLID-STATE ELECTRONICS,
1970,
13
(05)
:631
-+
[2]
Burstein E., 1957, SEMICONDUCTOR SURFAC
[3]
EQUIVALENT INPUT SPECTRUM AND DRAIN CURRENT SPECTRUM FOR 1-F NOISE IN SHORT CHANNEL MOS-TRANSISTORS
[J].
GENTIL, P
论文数:
0
引用数:
0
h-index:
0
GENTIL, P
;
MOUNIB, A
论文数:
0
引用数:
0
h-index:
0
MOUNIB, A
.
SOLID-STATE ELECTRONICS,
1981,
24
(05)
:411
-414
[4]
QUANTUM MECHANICAL CALCULATION OF CARRIER DISTRIBUTION AND THICKNESS OF INVERSION LAYER OF A MOS FIELD-EFFECT TRANSISTOR
[J].
GNADINGER, AP
论文数:
0
引用数:
0
h-index:
0
GNADINGER, AP
;
TALLEY, HE
论文数:
0
引用数:
0
h-index:
0
TALLEY, HE
.
SOLID-STATE ELECTRONICS,
1970,
13
(09)
:1301
-+
[5]
1-F NOISE
[J].
HOOGE, FN
论文数:
0
引用数:
0
h-index:
0
机构:
EINDHOVEN UNIV TECHNOL,DEPT ELECT ENGN,EINDHOVEN,NETHERLANDS
EINDHOVEN UNIV TECHNOL,DEPT ELECT ENGN,EINDHOVEN,NETHERLANDS
HOOGE, FN
.
PHYSICA B & C,
1976,
83
(01)
:14
-23
[6]
CARRIER FLUCTUATION NOISE IN A MOSFET CHANNEL DUE TO TRAPS IN OXIDE
[J].
JINDAL, RP
论文数:
0
引用数:
0
h-index:
0
JINDAL, RP
;
VANDERZIEL, A
论文数:
0
引用数:
0
h-index:
0
VANDERZIEL, A
.
SOLID-STATE ELECTRONICS,
1978,
21
(06)
:901
-903
[7]
PHONON FLUCTUATION MODEL FOR FLICKER NOISE IN ELEMENTAL SEMICONDUCTORS
[J].
JINDAL, RP
论文数:
0
引用数:
0
h-index:
0
JINDAL, RP
;
VANDERZIEL, A
论文数:
0
引用数:
0
h-index:
0
VANDERZIEL, A
.
JOURNAL OF APPLIED PHYSICS,
1981,
52
(04)
:2884
-2888
[8]
FLUCTUATIONS FROM THE NONEQUILIBRIUM STEADY STATE
[J].
LAX, M
论文数:
0
引用数:
0
h-index:
0
LAX, M
.
REVIEWS OF MODERN PHYSICS,
1960,
32
(01)
:25
-64
[9]
CORRELATION BETWEEN 1/F NOISE AND INTERFACE STATE DENSITY AT THE FERMI LEVEL IN FIELD-EFFECT TRANSISTORS
[J].
MAES, HE
论文数:
0
引用数:
0
h-index:
0
MAES, HE
;
USMANI, SH
论文数:
0
引用数:
0
h-index:
0
USMANI, SH
;
GROESENEKEN, G
论文数:
0
引用数:
0
h-index:
0
GROESENEKEN, G
.
JOURNAL OF APPLIED PHYSICS,
1985,
57
(10)
:4811
-4813
[10]
1/F NOISE IN THIN OXIDE P-CHANNEL METAL-NITRIDE-OXIDE-SILICON TRANSISTORS
[J].
MAES, HE
论文数:
0
引用数:
0
h-index:
0
MAES, HE
;
USMANI, SH
论文数:
0
引用数:
0
h-index:
0
USMANI, SH
.
JOURNAL OF APPLIED PHYSICS,
1983,
54
(04)
:1937
-1949
←
1
2
→
共 15 条
[1]
THEORY OF LOW FREQUENCY NOISE IN SI MOSTS
[J].
BERZ, F
论文数:
0
引用数:
0
h-index:
0
BERZ, F
.
SOLID-STATE ELECTRONICS,
1970,
13
(05)
:631
-+
[2]
Burstein E., 1957, SEMICONDUCTOR SURFAC
[3]
EQUIVALENT INPUT SPECTRUM AND DRAIN CURRENT SPECTRUM FOR 1-F NOISE IN SHORT CHANNEL MOS-TRANSISTORS
[J].
GENTIL, P
论文数:
0
引用数:
0
h-index:
0
GENTIL, P
;
MOUNIB, A
论文数:
0
引用数:
0
h-index:
0
MOUNIB, A
.
SOLID-STATE ELECTRONICS,
1981,
24
(05)
:411
-414
[4]
QUANTUM MECHANICAL CALCULATION OF CARRIER DISTRIBUTION AND THICKNESS OF INVERSION LAYER OF A MOS FIELD-EFFECT TRANSISTOR
[J].
GNADINGER, AP
论文数:
0
引用数:
0
h-index:
0
GNADINGER, AP
;
TALLEY, HE
论文数:
0
引用数:
0
h-index:
0
TALLEY, HE
.
SOLID-STATE ELECTRONICS,
1970,
13
(09)
:1301
-+
[5]
1-F NOISE
[J].
HOOGE, FN
论文数:
0
引用数:
0
h-index:
0
机构:
EINDHOVEN UNIV TECHNOL,DEPT ELECT ENGN,EINDHOVEN,NETHERLANDS
EINDHOVEN UNIV TECHNOL,DEPT ELECT ENGN,EINDHOVEN,NETHERLANDS
HOOGE, FN
.
PHYSICA B & C,
1976,
83
(01)
:14
-23
[6]
CARRIER FLUCTUATION NOISE IN A MOSFET CHANNEL DUE TO TRAPS IN OXIDE
[J].
JINDAL, RP
论文数:
0
引用数:
0
h-index:
0
JINDAL, RP
;
VANDERZIEL, A
论文数:
0
引用数:
0
h-index:
0
VANDERZIEL, A
.
SOLID-STATE ELECTRONICS,
1978,
21
(06)
:901
-903
[7]
PHONON FLUCTUATION MODEL FOR FLICKER NOISE IN ELEMENTAL SEMICONDUCTORS
[J].
JINDAL, RP
论文数:
0
引用数:
0
h-index:
0
JINDAL, RP
;
VANDERZIEL, A
论文数:
0
引用数:
0
h-index:
0
VANDERZIEL, A
.
JOURNAL OF APPLIED PHYSICS,
1981,
52
(04)
:2884
-2888
[8]
FLUCTUATIONS FROM THE NONEQUILIBRIUM STEADY STATE
[J].
LAX, M
论文数:
0
引用数:
0
h-index:
0
LAX, M
.
REVIEWS OF MODERN PHYSICS,
1960,
32
(01)
:25
-64
[9]
CORRELATION BETWEEN 1/F NOISE AND INTERFACE STATE DENSITY AT THE FERMI LEVEL IN FIELD-EFFECT TRANSISTORS
[J].
MAES, HE
论文数:
0
引用数:
0
h-index:
0
MAES, HE
;
USMANI, SH
论文数:
0
引用数:
0
h-index:
0
USMANI, SH
;
GROESENEKEN, G
论文数:
0
引用数:
0
h-index:
0
GROESENEKEN, G
.
JOURNAL OF APPLIED PHYSICS,
1985,
57
(10)
:4811
-4813
[10]
1/F NOISE IN THIN OXIDE P-CHANNEL METAL-NITRIDE-OXIDE-SILICON TRANSISTORS
[J].
MAES, HE
论文数:
0
引用数:
0
h-index:
0
MAES, HE
;
USMANI, SH
论文数:
0
引用数:
0
h-index:
0
USMANI, SH
.
JOURNAL OF APPLIED PHYSICS,
1983,
54
(04)
:1937
-1949
←
1
2
→