THE PROPERTIES AND APPLICATIONS OF LOW-ENERGY PLASMAS

被引：7

作者：

CURRAN, JE

机构：

来源：

VACUUM | 1984年 / 34卷 / 3-4期

关键词：

D O I：

10.1016/0042-207X(84)90064-2

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：343 / 345

页数：3

共 10 条

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[8] PROPERTIES OF PLASMA-ENHANCED CVD SILICON FILMS .1. UNDOPED FILMS DEPOSITED FROM 525-DEGREES-C TO 725-DEGREES-C [J].

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