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SURFACE CHEMICAL-SHIFTS AND PHOTOELECTRON DIFFRACTION IN COSI2
被引:40
作者
:
LECKEY, R
论文数:
0
引用数:
0
h-index:
0
机构:
MAX PLANCK INST FESTKORPERFORSCH,D-7000 STUTTGART 80,FED REP GER
LECKEY, R
RILEY, JD
论文数:
0
引用数:
0
h-index:
0
机构:
MAX PLANCK INST FESTKORPERFORSCH,D-7000 STUTTGART 80,FED REP GER
RILEY, JD
JOHNSON, RL
论文数:
0
引用数:
0
h-index:
0
机构:
MAX PLANCK INST FESTKORPERFORSCH,D-7000 STUTTGART 80,FED REP GER
JOHNSON, RL
LEY, L
论文数:
0
引用数:
0
h-index:
0
机构:
MAX PLANCK INST FESTKORPERFORSCH,D-7000 STUTTGART 80,FED REP GER
LEY, L
DITCHEK, B
论文数:
0
引用数:
0
h-index:
0
机构:
MAX PLANCK INST FESTKORPERFORSCH,D-7000 STUTTGART 80,FED REP GER
DITCHEK, B
机构
:
[1]
MAX PLANCK INST FESTKORPERFORSCH,D-7000 STUTTGART 80,FED REP GER
[2]
GTE LABS INC,WALTHAM,MA 02254
来源
:
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
|
1988年
/ 6卷
/ 01期
关键词
:
D O I
:
10.1116/1.574970
中图分类号
:
TB3 [工程材料学];
学科分类号
:
0805 ;
080502 ;
摘要
:
引用
收藏
页码:63 / 69
页数:7
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[33]
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[34]
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32
(01)
: 1
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←
1
2
3
4
→