AN INALAS/INAS MODFET

被引:17
作者
EUGSTER, CC
BROEKAERT, TPE
DELALAMO, JA
FONSTAD, CG
机构
[1] Department of Electrical Engineering and Computer Science, Massachusetts Institute of Technology, Cambridge
基金
美国国家科学基金会;
关键词
D O I
10.1109/55.116963
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We report what we believe is the first InAs modulation-doped field-effect transistor (MODFET) using an epitaxial heterostructure based entirely on arsenides. The heterostructure was grown by MBE on InP and contains a 30-angstrom InAs channel. An L(G) = 2-mu-m device displays well-behaved characteristics, showing sharp pinch-off (V(th) = -0.8 V) and small output conductance (5 mS/mm) at 300 K. The maximum transconductance is 170 mS/mm with a maximum drain current of 312 mA/mm. Strong channel quantization results in an unprecedented breakdown voltage of -9.6 V, a several-fold improvement over previous InAs MODFET's based on antimonides. Low-temperature magnetic field measurements show strong Shubnikov-de Haas oscillations which, over a certain range of gate voltage, strongly hint that the electron channel resides in the InAs layer.
引用
收藏
页码:707 / 709
页数:3
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