LOW-PRESSURE DEPOSITION OF PHOSPHOSILICATE GLASS-FILMS

[11] LOGAR RE, 1978, CHEM VAPOR DEPOSITIO, P195

[12] MIDDELHOEK J, 1975, CHEMICAL VAPOR DEPOS, P19

[13] MONKOWSKI J, 1976, SOLID STATE TECHNOL, V19, P38

[14] ROSLER RS, 1977, SOLID STATE TECHNOL, V20, P63

[15] SHIBATA M, 1975, J ELECTROCHEM SOC, V122, P157, DOI 10.1149/1.2134147

[16] DEPOSITION RATE AND PHOSPHORUS CONCENTRATION OF PHOSPHOSILICATE GLASS-FILMS IN RELATION TO O2-SIH4 + PH3 MOLE FRACTION [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1975, 122 (01) : 155 - 156

[17] SUGAWARA K, 1975, CHEM VAPOR DEPOS, P407

[18] FILMS FROM THE LOW-TEMPERATURE OXIDATION OF SILANE [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1979, 126 (10) : 1728 - 1731

[19] TANIKAWA E, 1973, CHEM VAPOR DEPOS, P261

[20] WAHL G, 1975, CHEMICAL VAPOR DEPOS, P391

[11] LOGAR RE, 1978, CHEM VAPOR DEPOSITIO, P195

[12] MIDDELHOEK J, 1975, CHEMICAL VAPOR DEPOS, P19

[13] MONKOWSKI J, 1976, SOLID STATE TECHNOL, V19, P38

[14] ROSLER RS, 1977, SOLID STATE TECHNOL, V20, P63

[15] SHIBATA M, 1975, J ELECTROCHEM SOC, V122, P157, DOI 10.1149/1.2134147

[16] DEPOSITION RATE AND PHOSPHORUS CONCENTRATION OF PHOSPHOSILICATE GLASS-FILMS IN RELATION TO O2-SIH4 + PH3 MOLE FRACTION [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1975, 122 (01) : 155 - 156

[17] SUGAWARA K, 1975, CHEM VAPOR DEPOS, P407

[18] FILMS FROM THE LOW-TEMPERATURE OXIDATION OF SILANE [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1979, 126 (10) : 1728 - 1731

[19] TANIKAWA E, 1973, CHEM VAPOR DEPOS, P261

[20] WAHL G, 1975, CHEMICAL VAPOR DEPOS, P391