PHOTOSTRUCTURING OF A POLYMER CONTAINING ANTHRYLENE-BISACRYLATE SUBUNITS

被引：13

作者：

PAUL, S

STEIN, S

KNOLL, W

MULLEN, K

机构：

[1] MAX PLANCK INST POLYMER RES,ACKERMANNWEG 10,D-55128 MAINZ,GERMANY

[2] INST PHYS & CHEM RES RIKEN,FRONTIER RES PROGRAM,WAKO,SAITAMA 35101,JAPAN

来源：

ACTA POLYMERICA | 1994年 / 45卷 / 03期

关键词：

D O I：

10.1002/actp.1994.010450315

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

A new polymer P containing anthrylene-bisacrylate subunits is presented which allows the preparation of spin-cast films of high optical and geometrical homogeneity.Upon irradiation of these films with UV light,both a change in the optical thickness (= geometrical thickness d x refractive index n) and a decrease of the solubility can be induced due to photo-crosslinking of the polymer chains. These features make the new polymer a promising material for both optical information storage and photolithography and/or for a possible combination of the two effects.

引用

页码：235 / 243

页数：9

共 16 条

[1]

Bowen E.J., 1963, ADV PHOTOCHEM, V<bold>1</bold>, P23

[2]

BROUSSARD JA, 1976, Patent No. 3989740

[3]

DUMONT M, 1991, NATO ASI SER, V194

[4] X-RAY REFLECTOMETER FOR STUDY OF POLYMER THIN-FILMS AND INTERFACES [J].