XPS ANALYSIS OF SI AND SIO2 SURFACES EXPOSED TO CHF3 AND CHF3-C2F6 PLASMAS - POLYMERIZATION AND ETCHING

被引：48

作者：

CARDINAUD, C

RHOUNNA, A

TURBAN, G

GROLLEAU, B

机构：

来源：

REVUE DE PHYSIQUE APPLIQUEE | 1989年 / 24卷 / 03期

关键词：

D O I：

10.1051/rphysap:01989002403030900

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：309 / 321

页数：13

共 23 条

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