THERMODYNAMIC INVESTIGATION OF SELECTIVE MOLYBDENUM CHEMICAL VAPOR-DEPOSITION - INFLUENCE OF GROWTH-CONDITIONS AND GAS ADDITIVES ON THE SELECTIVITY OF THE PROCESS

被引：6

作者：

HARSTA, A

CARLSSON, JO

机构：

[1] Department of Chemistry, Thin Film and Surface Chemistry Group, University of Uppsala, S-751 21 Uppsala

来源：

THIN SOLID FILMS | 1990年 / 185卷 / 02期

关键词：

Molybdenum and Alloys;

D O I：

10.1016/0040-6090(90)90088-U

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Two steps in selective molybdenum deposition from MoF6 were analysed thermodynamically: the initial step which is silicon reduction of MoF6 and the continuation step which is H2 reduction. The trends in selective deposition were analysed from calculated driving force values for the initial step, while chemical potentials were used for the continuation step. These reaction gas mixtures were analysed: H2MoF6, H2MoF6SiH4 and H2MoF6SiF4. Additions of SiH4 were predicted to increase the selectivity drastically, while SiF4 additions had only minor effects. The results of the thermodynamic analysis were compared with those obtained for the corresponding tungsten systems. The two processes were found to be very similar from a thermodynamic point of view. © 1990.

引用

页码：235 / 246

页数：12

共 17 条

[1]

Barin I., 1973, THERMOCHEMICAL PROPE

[2]

BREWER L, 1978, P ELECTROCHEM SOC, V78, P177

[3] THERMODYNAMIC INVESTIGATION OF SELECTIVE TUNGSTEN CHEMICAL VAPOR-DEPOSITION - INFLUENCE OF GROWTH-CONDITIONS AND GAS ADDITIVES ON THE SELECTIVITY IN THE FLUORIDE PROCESS [J].