SPATIAL DEPENDENCE OF PARTICLE LIGHT-SCATTERING IN AN RF SILANE DISCHARGE

[1] EFFECTS OF FREQUENCY ON MODELING HIGH-FREQUENCY ELECTRIC DISCHARGE REACTORS [J]. INDUSTRIAL & ENGINEERING CHEMISTRY FUNDAMENTALS, 1970, 9 (04): : 679 - &

[2] PULSED UV LASER RAMAN-SPECTROSCOPY OF SILANE IN A LINEAR-FLOW CHEMICAL VAPOR-DEPOSITION REACTOR [J]. APPLIED PHYSICS LETTERS, 1983, 42 (04) : 395 - 397

[3] ION DYNAMICS OF RF PLASMAS AND PLASMA SHEATHS - A TIME-RESOLVED SPECTROSCOPIC STUDY [J]. JOURNAL OF APPLIED PHYSICS, 1984, 55 (07) : 2707 - 2714

[4] DETECTION OF NEUTRAL SPECIES IN SILANE PLASMA USING COHERENT ANTI-STOKES RAMAN-SPECTROSCOPY [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1983, 22 (01): : L1 - L3

[5] Hata N., 1983, Proceedings of the International Ion Engineering Congress. The 7th Symposium (1983 International) on Ion Sources and Ion Assisted Technology (ISIAT '83) and the 4th International Conference on Ion and Plasma Assisted Techniques (IPAT '83), P1457

[6] OBSERVATION OF SI2 IN A CHEMICAL VAPOR-DEPOSITION REACTOR BY LASER-EXCITED FLUORESCENCE [J]. APPLIED PHYSICS LETTERS, 1984, 44 (01) : 51 - 53

[7] LASER-INDUCED FLUORESCENCE OF THE SIH2 RADICAL [J]. CHEMICAL PHYSICS LETTERS, 1984, 105 (06) : 641 - 644

[8] DETECTION OF SIH2 IN SILANE AND DISILANE GLOW-DISCHARGES BY FREQUENCY-MODULATION ABSORPTION-SPECTROSCOPY [J]. APPLIED PHYSICS LETTERS, 1984, 44 (12) : 1155 - 1157

[9] HYDROGEN IN AMORPHOUS-SEMICONDUCTORS [J]. CRC CRITICAL REVIEWS IN SOLID STATE AND MATERIALS SCIENCES, 1980, 9 (03): : 211 - 283

[10] MONTE-CARLO SIMULATION OF ELECTRON PROPERTIES IN RF PARALLEL PLATE CAPACITIVELY COUPLED DISCHARGES [J]. JOURNAL OF APPLIED PHYSICS, 1983, 54 (09) : 4958 - 4965

[1] EFFECTS OF FREQUENCY ON MODELING HIGH-FREQUENCY ELECTRIC DISCHARGE REACTORS [J]. INDUSTRIAL & ENGINEERING CHEMISTRY FUNDAMENTALS, 1970, 9 (04): : 679 - &

[2] PULSED UV LASER RAMAN-SPECTROSCOPY OF SILANE IN A LINEAR-FLOW CHEMICAL VAPOR-DEPOSITION REACTOR [J]. APPLIED PHYSICS LETTERS, 1983, 42 (04) : 395 - 397

[3] ION DYNAMICS OF RF PLASMAS AND PLASMA SHEATHS - A TIME-RESOLVED SPECTROSCOPIC STUDY [J]. JOURNAL OF APPLIED PHYSICS, 1984, 55 (07) : 2707 - 2714

[4] DETECTION OF NEUTRAL SPECIES IN SILANE PLASMA USING COHERENT ANTI-STOKES RAMAN-SPECTROSCOPY [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1983, 22 (01): : L1 - L3

[5] Hata N., 1983, Proceedings of the International Ion Engineering Congress. The 7th Symposium (1983 International) on Ion Sources and Ion Assisted Technology (ISIAT '83) and the 4th International Conference on Ion and Plasma Assisted Techniques (IPAT '83), P1457

[6] OBSERVATION OF SI2 IN A CHEMICAL VAPOR-DEPOSITION REACTOR BY LASER-EXCITED FLUORESCENCE [J]. APPLIED PHYSICS LETTERS, 1984, 44 (01) : 51 - 53

[7] LASER-INDUCED FLUORESCENCE OF THE SIH2 RADICAL [J]. CHEMICAL PHYSICS LETTERS, 1984, 105 (06) : 641 - 644

[8] DETECTION OF SIH2 IN SILANE AND DISILANE GLOW-DISCHARGES BY FREQUENCY-MODULATION ABSORPTION-SPECTROSCOPY [J]. APPLIED PHYSICS LETTERS, 1984, 44 (12) : 1155 - 1157

[9] HYDROGEN IN AMORPHOUS-SEMICONDUCTORS [J]. CRC CRITICAL REVIEWS IN SOLID STATE AND MATERIALS SCIENCES, 1980, 9 (03): : 211 - 283

[10] MONTE-CARLO SIMULATION OF ELECTRON PROPERTIES IN RF PARALLEL PLATE CAPACITIVELY COUPLED DISCHARGES [J]. JOURNAL OF APPLIED PHYSICS, 1983, 54 (09) : 4958 - 4965