EXCIMER LASER-INDUCED CHEMICAL VAPOR-DEPOSITION OF TITANIUM SILICIDE

被引：17

作者：

GUPTA, A ^{[1
]}

WEST, GA ^{[1
]}

BEESON, KW ^{[1
]}

机构：

[1] ALLIED CORP,CORP TECHNOL,MORRISTOWN,NJ 07960

来源：

关键词：

D O I：

10.1063/1.335733

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：3573 / 3582

页数：10

共 22 条

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[J]. APPLIED PHYSICS LETTERS, 1982, 40 (02) : 183 - 185
[3] BRORS DL, 1983, SOLID STATE TECHNOL, V26, P183
[4] Clark R. J. H., 1968, CHEM TITANIUM VANADI
[5] REACTIONS OF SILANES WITH HALOGENS - CHEMILUMINESCENT PRODUCTS IN ULTRAVIOLET-VISIBLE SPECTRUM
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[6] COMPARISON OF LASER-INITIATED AND THERMAL CHEMICAL VAPOR-DEPOSITION OF TUNGSTEN FILMS
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[J]. APPLIED PHYSICS LETTERS, 1984, 45 (06) : 623 - 625
[7] DEUTSCH TF, 1984, P MRS S LASER CONTRO, V29, P67
[8] EMERY K, 1984, P SOC PHOTO-OPT INST, V459, P9, DOI 10.1117/12.939428
[9] HEIBER K, 1984, 9TH P INT C CVD EL S, P205
[10] PROPERTIES OF MOLYBDENUM SILICIDE FILM DEPOSITED BY CHEMICAL VAPOR-DEPOSITION
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[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1983, 130 (07) : 1603 - 1607