THE FLIP-AND-SHIFT SIGNAL ENHANCEMENT APPLICATION FOR A PREDICTIVE ELECTRON-BEAM PATTERN REGISTRATION MODEL

被引:2
作者
KING, DC
STECKL, AJ
MORGENSTERN, JL
MCDONALD, JF
BOURGEOIS, MA
YEMC, DJ
ELMINYAWI, I
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1986年 / 4卷 / 01期
关键词
D O I
10.1116/1.583312
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:273 / 279
页数:7
相关论文
共 12 条
[1]   HIGH-RESOLUTION ELECTRON-BEAM LITHOGRAPHY ON THIN-FILMS [J].
ADESIDA, I ;
EVERHART, TE ;
SHIMIZU, R .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06) :1743-1748
[2]   BACK SCATTERING OF ELECTRONS [J].
ARCHARD, GD .
JOURNAL OF APPLIED PHYSICS, 1961, 32 (08) :1505-&
[3]  
Bethe H, 1930, ANN PHYS-BERLIN, V5, P325
[5]   SIMPLE THEORY CONCERNING THE REFLECTION OF ELECTRONS FROM SOLIDS [J].
EVERHART, TE .
JOURNAL OF APPLIED PHYSICS, 1960, 31 (08) :1483-1490
[6]  
Franklin G. F., 1980, DIGITAL CONTROL DYNA
[7]   MONTE-CARLO SIMULATION OF REGISTRATION SIGNALS FOR ELECTRON-BEAM MICROFABRICATION [J].
LIN, YC ;
ADESIDA, I ;
NEUREUTHER, AR .
APPLIED PHYSICS LETTERS, 1980, 36 (08) :672-674
[8]  
MORGENSTERN JL, 1984, THESIS RENSSELAER PO
[9]  
MORGENSTERN JL, 1983, J ELECTROCHEM SOC, P329
[10]   SPATIAL DISTRIBUTION OF BACKSCATTERED ELECTRONS IN SCANNING ELECTRON-MICROSCOPE AND ELECTRON-MICROPROBE [J].
MURATA, K .
JOURNAL OF APPLIED PHYSICS, 1974, 45 (09) :4110-4117