MONTE-CARLO SIMULATION OF REGISTRATION SIGNALS FOR ELECTRON-BEAM MICROFABRICATION

被引:7
作者
LIN, YC
ADESIDA, I
NEUREUTHER, AR
机构
关键词
D O I
10.1063/1.91604
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:672 / 674
页数:3
相关论文
共 19 条
[1]   HIGH-RESOLUTION ELECTRON-BEAM LITHOGRAPHY ON THIN-FILMS [J].
ADESIDA, I ;
EVERHART, TE ;
SHIMIZU, R .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06) :1743-1748
[2]   CONTROL-SYSTEM DESIGN AND ALIGNMENT METHODS FOR ELECTRON LITHOGRAPHY [J].
ALLES, DS ;
ASHLEY, FR ;
JOHNSON, AM ;
TOWNSEND, RL .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06) :1252-1256
[3]  
DAVIS DE, 1977, IBM J RES DEV, V21, P498, DOI 10.1147/rd.216.0498
[4]   DETERMINATION OF KILOVOLT ELECTRON ENERGY DISSIPATION VS PENETRATION DISTANCE IN SOLID MATERIALS [J].
EVERHART, TE ;
HOFF, PH .
JOURNAL OF APPLIED PHYSICS, 1971, 42 (13) :5837-&
[5]   A WATER-AMINE-COMPLEXING AGENT SYSTEM FOR ETCHING SILICON [J].
FINNE, RM ;
KLEIN, DL .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1967, 114 (09) :965-&
[6]   ENERGY DISSIPATION IN A THIN POLYMER FILM BY ELECTRON-BEAM SCATTERING [J].
HAWRYLUK, RJ ;
HAWRYLUK, AM ;
SMITH, HI .
JOURNAL OF APPLIED PHYSICS, 1974, 45 (06) :2551-2566
[7]   QUANTITATIVE ELECTRON-MICROPROBE ANALYSIS OF THIN-FILMS ON SUBSTRATES [J].
KYSER, DF ;
MURATA, K .
IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1974, 18 (04) :352-363
[8]   HIGH-CONTRAST REGISTRATION MARKS FOR ELECTRON-BEAM PATTERN EXPOSURE ON (100) SILICON [J].
LIDA, Y ;
EVERHART, TE .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (03) :917-920
[9]  
Mauer J. L., 1978, IBM Technical Disclosure Bulletin, V21, P1464
[10]   COMPUTER-CONTROLLED ELECTRON-BEAM MICROFABRICATION MACHINE WITH A NEW REGISTRATION SYSTEM [J].
SAITOU, N ;
MUNAKATA, C ;
MIURA, Y ;
HONDA, Y .
JOURNAL OF PHYSICS E-SCIENTIFIC INSTRUMENTS, 1974, 7 (06) :441-444