PREPARATION AND CHARACTERIZATION OF V-N FILMS DEPOSITED BY REACTIVE TRIODE MAGNETRON SPUTTERING

V-N coatings were produced by high current density triode magnetron sputtering in the reactive mode. The influence of basic deposition parameters, mainly nitrogen partial pressure, on the composition, crystal structure and hardness of the V-N films were investigated using electron probe microanalysis, X-ray diffraction and Vickers microhardness testing. The film deposition rate was measured by means of optical emission spectroscopy and a quartz film thickness monitor, The beta-V2Nx phase was obtained for x in the range 0.38-0.50. The delta-VNx phase was identified for coatings containing 42.2-49 at.% N. The texture of delta-VNx coatings changed from a strong preferential orientation [200] to mixed [111] and [200] and finally to [200] for nitrogen-rich coatings. The highest Vickers microhardness, 3600 HV 0.1, was measured for coatings containing in the range 33.3-42.2 at.% N.