A MULTIRESPONSE FACTORIAL STUDY OF REACTOR PARAMETERS IN PLASMA-ENHANCED CVD GROWTH OF AMORPHOUS-SILICON NITRIDE

被引：15

作者：

BOHN, PW ^{[1
]}

MANZ, RC ^{[1
]}

机构：

[1] AT&T BELL LABS,MURRAY HILL,NJ 07974

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1985年 / 132卷 / 08期

关键词：

D O I：

10.1149/1.2114265

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1981 / 1984

页数：4

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