THICKNESS DEPENDENCE OF H-2 GAS SENSOR IN AMORPHOUS SNOX FILMS PREPARED BY ION-BEAM SPUTTERING

被引：19

作者：

SUZUKI, T

YAMAZAKI, T

YOSHIOKA, H

HIKICHI, K

机构：

[1] Tokyo Univ of Agriculture &, Technology, Koganei, Jpn, Tokyo Univ of Agriculture & Technology, Koganei, Jpn

来源：

关键词：

AMORPHOUS FILM SENSORS - ION-BEAM SPUTTERING - SINTERED ALUMINA SUBSTRATES - TIN OXIDES - ULTRATHIN FILM SENSORS;

D O I：

10.1007/BF01174046

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：145 / 149

页数：5

共 15 条

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