ERROR MINIMIZATION METHOD FOR SPECTROSCOPIC AND PHASE-MODULATED ELLIPSOMETRIC MEASUREMENTS ON HIGHLY TRANSPARENT THIN-FILMS

被引:11
作者
CAMPMANY, J
BERTRAN, E
CANILLAS, A
ANDUJAR, JL
COSTA, J
机构
[1] Departament de Física Aplicada i Electrónica, Universität de Barcelona, Barcelona, Catalonia, E-08028, Avinguda Diagonal
来源
JOURNAL OF THE OPTICAL SOCIETY OF AMERICA A-OPTICS IMAGE SCIENCE AND VISION | 1993年 / 10卷 / 04期
关键词
D O I
10.1364/JOSAA.10.000713
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
We point out that there is an intrinsic magnification of error in the measurement of transparent or semitransparent thin films by the usual method of phase-modulated ellipsometry. This procedure is suitable for absorbing materials, but for nonabsorbing materials it gives a great amount of error in the measurement of ellipsometric angles at some critical values. We propose a new methodology for the phase-modulated ellipsometric measurements that avoids this magnification. We illustrate the advantages of this new method by measuring the index of refraction of a low-pressure chemical-vapor-deposited a-SiO2 thin film with greater accuracy than that achieved by the usual method.
引用
收藏
页码:713 / 718
页数:6
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