SELECTIVE-AREA EPITAXY OF GAAS THROUGH SILICON DIOXIDE WINDOWS BY MOLECULAR-BEAM EPITAXY

被引:15
作者
HONG, JM
WANG, S
SANDS, T
WASHBURN, J
FLOOD, JD
MERZ, JL
LOW, T
机构
[1] UNIV CALIF BERKELEY LAWRENCE BERKELEY LAB,DEPT MAT SCI & MINERAL ENGN,BERKELEY,CA 94720
[2] UNIV CALIF BERKELEY LAWRENCE BERKELEY LAB,DIV MAT & MOLEC RES,BERKELEY,CA 94720
[3] UNIV CALIF SANTA BARBARA,DEPT ELECT & COMP ENGN,SANTA BARBARA,CA 93106
[4] HEWLETT PACKARD LABS,PALO ALTO,CA 94304
关键词
D O I
10.1063/1.96977
中图分类号
O59 [应用物理学];
学科分类号
摘要
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页码:142 / 144
页数:3
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