THE EFFECTS OF INTERFACIAL SIO2 ON PD2SI FORMATION

被引：27

作者：

SCOTT, DM

LAU, SS

PFEFFER, RL

LUX, RA

MIKKELSON, J

WIELUNSKI, L

NICOLET, MA

机构：

[1] USA,ELECTR RES & DEV COMMAND,FT MONMOUTH,NJ 07703

[2] XEROX CORP,PALO ALTO,CA 94304

[3] CALTECH,PASADENA,CA 91125

来源：

THIN SOLID FILMS | 1983年 / 104卷 / 1-2期

关键词：

D O I：

10.1016/S0040-6090(83)80001-7

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：227 / 233

页数：7

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