SOME ASPECTS OF ION-BEAM INDUCED METAL-SILICON REACTIONS

被引：2

作者：

COLLIGON, JS

KHEYRANDISH, H

STEPHENS, GA

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1987年 / 5卷 / 04期

关键词：

D O I：

10.1116/1.574609

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：1417 / 1417

页数：1

共 8 条

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[3]

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[5] ION-BEAM-INDUCED REACTIONS IN METAL-SEMICONDUCTOR AND METAL-METAL THIN-FILM STRUCTURES [J].

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HUNG, LS .

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[6] THEORETICAL ASPECTS OF ATOMIC MIXING BY ION-BEAMS [J].

SIGMUND, P ;

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[7]

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[8]

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