LOW-ENERGY ION IRRADIATION DURING FILM GROWTH FOR REDUCING DEFECT DENSITIES IN EPITAXIAL TIN(100) FILMS DEPOSITED BY REACTIVE-MAGNETRON SPUTTERING

被引：100

作者：

HULTMAN, L

HELMERSSON, U

BARNETT, SA

SUNDGREN, JE

GREENE, JE

机构：

[1] UNIV ILLINOIS,DEPT MAT SCI,URBANA,IL 61801

[2] UNIV ILLINOIS,COORDINATED SCI LAB,URBANA,IL 61801

[3] UNIV ILLINOIS,MAT RES LAB,URBANA,IL 61801

来源：

关键词：

D O I：

10.1063/1.338257

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：552 / 555

页数：4

共 19 条

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