DRY DEVELOPMENT OF RESISTS EXPOSED TO LOW-ENERGY FOCUSED GALLIUM ION-BEAM

被引：23

作者：

KUWANO, H

机构：

来源：

关键词：

D O I：

10.1063/1.333208

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1149 / 1154

页数：6

共 5 条

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ADESIDA, I ;

CHINN, JD ;

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WOLF, ED .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 21 (02) :666-671

[2] MINIATURE ION SOURCES FOR ANALYTICAL INSTRUMENTS [J].

CLAMPITT, R ;

JEFFERIES, DK .

NUCLEAR INSTRUMENTS & METHODS, 1978, 149 (1-3) :739-742

[3] DRY DEVELOPMENT OF RESISTS EXPOSED TO FOCUSED GALLIUM ION-BEAM [J].

KUWANO, H ;

YOSHIDA, K ;

YAMAZAKI, SI .

MATSUO, S ;

TAKEHARA, Y ;

OZAWA, A .

VENKATESAN, T ;

TAYLOR, GN ;

WAGNER, A ;

WILKENS, B ;

BARR, D .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04) :1379-1384