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ATTAINMENT OF 0.13-MUM LINES AND SPACES BY EXCIMER-LASER PROJECTION LITHOGRAPHY IN DIAMOND-LIKE CARBON-RESIST

被引：36
作者：
ROTHSCHILD, M
EHRLICH, DJ
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1987年 / 5卷 / 01期
关键词：
D O I：
10.1116/1.583910
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：389 / 390
页数：2
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[6]   EXCIMER-LASER ETCHING OF DIAMOND AND HARD CARBON-FILMS BY DIRECT WRITING AND OPTICAL PROJECTION [J].
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JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1986, 4 (01) :310-314
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