EXCIMER LASER PROJECTION LITHOGRAPHY ON A FULL-FIELD SCANNING PROJECTION SYSTEM

被引：7

作者：

KERTH, RT

JAIN, K

LATTA, MR

机构：

来源：

IEEE ELECTRON DEVICE LETTERS | 1986年 / 7卷 / 05期

关键词：

D O I：

10.1109/EDL.1986.26380

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：299 / 301

页数：3

共 11 条

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[9] EXCIMER LASER EXPOSURE OF AG2SE/GESE2 - HIGH CONTRAST EFFECTS [J].

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[10] RECIPROCITY BEHAVIOR OF PHOTORESISTS IN EXCIMER LASER LITHOGRAPHY [J].

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