PREFERENTIAL SPUTTERING EFFECTS IN TANTALUM NITRIDE THIN-FILMS

被引：16

作者：

PALACIO, C

SANZ, JM

MARTINEZDUART, JM

机构：

来源：

THIN SOLID FILMS | 1985年 / 124卷 / 3-4期

关键词：

D O I：

10.1016/0040-6090(85)90272-X

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：243 / 247

页数：5

共 11 条

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PALACIO, C ;

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[8] RECOIL IMPLANTATION AND ION-BEAM-INDUCED COMPOSITION CHANGES IN ALLOYS AND COMPOUNDS [J].

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[9]

SIGMUND P, 1981, SPUTTERING PARTICLE, V1

[10] MASS AND ENERGY-DEPENDENCE OF EQUILIBRIUM SURFACE COMPOSITION OF SPUTTERED TANTALUM OXIDE [J].

TAGLAUER, E ;

HEILAND, W .

APPLIED PHYSICS LETTERS, 1978, 33 (11) :950-952

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