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RESISITIVITY CHANGE IN TI/AU BIMETAL FILMS ANNEALED IN THE TEMPERATURE-RANGE 300-DEGREES-C TO 400-DEGREES-C

被引：3
作者：
LING, CH
机构：
来源：
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1983年 / 80卷 / 01期
关键词：
D O I：
10.1002/pssa.2210800160
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
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页码：K59 / K62
页数：4
相关论文
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