MASKED ION-BEAM RESIST EXPOSURE USING GRID SUPPORT STENCIL MASKS

被引:27
作者
RANDALL, JN
FLANDERS, DC
ECONOMOU, NP
DONNELLY, JP
BROMLEY, EI
机构
[1] MIT, Lincoln Lab, Lexington, MA, USA, MIT, Lincoln Lab, Lexington, MA, USA
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1985年 / 3卷 / 01期
关键词
GRID SUPPORT STENCIL MASKS - ION BEAM LITHOGRAPHY - MASKED ION BEAM RESIST EXPOSURE - SUBMICRON LITHOGRAPHY;
D O I
10.1116/1.583291
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:58 / 61
页数:4
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