ANALYTICAL EXPRESSION DESCRIBING THE ATTENUATION OF AUGER ELECTRONS AND PHOTOELECTRONS IN SOLIDS

被引:65
作者
WERNER, WSM [1 ]
GRIES, WH [1 ]
STORI, H [1 ]
机构
[1] DEUTSCHE BUNDESPOST TELEKOM,RES INST,W-6100 DARMSTADT,GERMANY
关键词
D O I
10.1002/sia.740171003
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The attenuation of Auger electrons and photoelectrons in solids, as described by the so-called depth distribution function (DDF), has been studied by means of a Monte Carlo simulation of electron transport in matter. Elastic scattering plays a significant role in the model. Based on the results of a large number of simulations, an empirically derived analytical expression for the DDF is proposed that includes the effects of elastic scattering. As part of this analytical DDF, a new attenuation parameter (AP) is introduced, which, being a material constant independent of emission angle and layer thickness, can assume a central role in quantitative AES and XPS. The proposed AP as well as the general validity of the results is discussed. Most importantly, a simple relationship between the most significant quantities governing the transport of electrons in solids, i.e. the inelastic mean free path (IMFP), the total mean free path (TMFP) and the attenuation parameter, was derived from the results. By a single Monte Carlo simulation, the AP can be determined. The DDF for different experimental geometries, film thicknesses, etc. can then be determined analytically.
引用
收藏
页码:693 / 704
页数:12
相关论文
共 33 条
[11]  
Gregory D., 1974, Atomic Data and Nuclear Data Tables, V14, P39, DOI 10.1016/S0092-640X(74)80029-X
[12]   TAKE-OFF ANGLE AND FILM THICKNESS DEPENDENCES OF THE ATTENUATION LENGTH OF X-RAY PHOTOELECTRONS BY A TRAJECTORY REVERSAL METHOD [J].
GRIES, WH ;
WERNER, W .
SURFACE AND INTERFACE ANALYSIS, 1990, 16 (1-12) :149-153
[13]   SIMULATION OF ELECTRON SOLID INTERACTION AND ITS APPLICATION TO QUANTITATIVE-ANALYSIS BY AUGER-ELECTRON SPECTROSCOPY [J].
ICHIMURA, S ;
DING, ZJ ;
SHIMIZU, R .
SURFACE AND INTERFACE ANALYSIS, 1988, 13 (2-3) :149-159
[14]   BACKSCATTERING CORRECTION FOR QUANTITATIVE AUGER ANALYSIS .1. MONTE-CARLO CALCULATIONS OF BACKSCATTERING FACTORS FOR STANDARD MATERIALS [J].
ICHIMURA, S ;
SHIMIZU, R .
SURFACE SCIENCE, 1981, 112 (03) :386-408
[15]   COMPARISON OF THE ATTENUATION LENGTHS AND THE INELASTIC MEAN FREE-PATH FOR PHOTOELECTRONS IN SILVER [J].
JABLONSKI, A ;
TOUGAARD, S .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1990, 8 (01) :106-116
[16]   COMPARISON OF ELECTRON ATTENUATION LENGTHS AND ESCAPE DEPTHS WITH INELASTIC MEAN FREE PATHS [J].
JABLONSKI, A ;
EBEL, H .
SURFACE AND INTERFACE ANALYSIS, 1988, 11 (12) :627-632
[17]   EFFECTS OF AUGER-ELECTRON ELASTIC-SCATTERING IN QUANTITATIVE AES [J].
JABLONSKI, A .
SURFACE SCIENCE, 1987, 188 (1-2) :164-180
[18]   ELASTIC ELECTRON BACKSCATTERING FROM SURFACES [J].
JABLONSKI, A ;
GRYKO, J ;
KRAAER, J ;
TOUGAARD, S .
PHYSICAL REVIEW B, 1989, 39 (01) :61-71
[19]   EFFECT OF THE ANALYZER ACCEPTANCE ANGLE ON THE PHOTOELECTRON INTENSITY [J].
JABLONSKI, A ;
EBEL, MF ;
EBEL, H .
JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, 1987, 42 (03) :235-243
[20]   ELASTIC-SCATTERING AND QUANTIFICATION IN AES AND XPS [J].
JABLONSKI, A .
SURFACE AND INTERFACE ANALYSIS, 1989, 14 (11) :659-685